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Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

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Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

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Brand Name : JUNHE

Model Number : JH-216

Certification : ISO9001 CE ROHS

Place of Origin : Changzhou in China

MOQ : 100 Kilograms

Price : Negotiable

Payment Terms : L/C, T/T

Supply Ability : 2 Tons per Day

Delivery Time : Ten days after receipt of advance payment

Packaging Details : 1000kg/barrel,25kg/plastic drum

color : Colorless to yellowish liquid

proportion : 1.15-1.25

PH : ≥14

free alkalinity : 300-400

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JH-216 High concentration of two components named Silicon Slice Detergent ​ph≥14 Specific weight 1.15-1.25

1. Brief

This is patent products for degreasing electron level and solar grade silicon slice in IT and solar battery area, and the patent number is ZL200710020269.6. The product contain double group with good performance in emulsion saponifiation edulcoration to tallowvegetable oilmineral oilsoliquiodgrinding past , also in stripingcomplexing edulcoration to metal ion.

2. Key feature

1) double group products with perfect PPR(performance price ratio),Especially suitable for cleaning heavily polluted wafers.

2) be free from calcium, magnesium, metal, copper, lead and phosphor, and meet the requirement of ROHS.

3) low foam, no foam overflow in ultrasonic cleaning and friendly to the environment.

4) good degreasing performance to meet the requirement of high-accuracy IT area in Asian countrys.

3. Technical parameter

lassification

project

JH-216 Test Standard
Appearance Colorless to yellowish liquid visualization
Specific weight 1.15-1.25 densimeter
pH ≥14 PH instrument
free alkalinity(piont) 300-400 CYFC

4. Instructions

1) put pure water into cleaning tank till three-quarter, then, add agent in 3% -8% concentration, add water till working level, last, heat the bath solution till working temperature.

2) need to change bath solution completely after degreasing certain amount silicon slice.

3) reduce exposed time in air to avoid oxidation.

4) working temperature degree in needed, disposal time: 2-5minutes.

5. Notes

1. The ingot after wire cutting should not be stained with water. If it cannot be cleaned in time, it is best to store it in suspension or cleaning agent (all immersed).


2. Once the wire rod is cut, it must be disposed of immediately. Moreover, the silicon wafer should not be allowed to dry naturally throughout the cleaning process.


3. The silicon wafer must be kept wet when degumming, and it should not be dried naturally.

6. Additions

1) packing:20kg/carton(2kg/bottle),25kg/plastic barrel, 1000kg/barrel

2) validity time: one year

Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam


Product Tags:

Industrial Chemical Cleaning

      

Ultrasonic Cleaning Chemicals

      
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